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General atomistic approach for modeling metal-semiconductor interfaces using density functional theory and non-equilibrium Green's function

机译:用于建模金属 - 半导体界面的一般原子方法   使用密度泛函理论和非平衡格林函数

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摘要

Metal-semiconductor contacts are a pillar of modern semiconductor technology.Historically, their microscopic understanding has been hampered by theinability of traditional analytical and numerical methods to fully capture thecomplex physics governing their operating principles. Here we introduce anatomistic approach based on density functional theory and non-equilibriumGreen's function, which includes all the relevant ingredients required to modelrealistic metal-semiconductor interfaces and allows for a direct comparisonbetween theory and experiments via I-V bias curves simulations. We apply thismethod to characterize an Ag/Si interface relevant for photovoltaicapplications and study the rectifying-to-Ohmic transition as function of thesemiconductor doping.We also demonstrate that the standard "Activation Energy"method for the analysis of I-V bias data might be inaccurate for non-idealinterfaces as it neglects electron tunneling, and that finite-size atomisticmodels have problems in describing these interfaces in the presence of doping,due to a poor representation of space-charge effects. Conversely, the presentmethod deals effectively with both issues, thus representing a validalternative to conventional procedures for the accurate characterization ofmetal-semiconductor interfaces.
机译:金属-半导体触点是现代半导体技术的支柱。从历史上看,传统的分析和数值方法无法完全捕获控制其工作原理的复杂物理,因此妨碍了它们的微观理解。在这里,我们介绍基于密度泛函理论和非平衡格林函数的解剖学方法,其中包括对真实的金属-半导体界面进行建模所需的所有相关成分,并允许通过I-V偏置曲线模拟在理论与实验之间进行直接比较。我们将该方法用于表征与光伏应用相关的Ag / Si界面,并研究了整流向欧姆跃迁作为这些半导体掺杂的函数。我们还证明了用于分析IV偏置数据的标准“活化能”方法可能不准确。非理想界面,因为它忽略了电子隧穿,并且有限空间原子模型在描述存在掺杂的界面时存在问题,原因是对空间电荷效应的描述不佳。相反,本方法有效地处理了两个问题,从而代表了传统过程的有效替代方案,用于金属-半导体界面的准确表征。

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